Pure Si at 300 K has equal electron (ne) and hole (nh) concentration of 1.5 * 10^16 m^-3. Doping by indium increases nh to 4.5 * 10^22 m^-3. Calculate ne in the doped silicon. Pure Si at 300 K has equal electron (ne) and hole (nh) concentration of 1.5 * 10^16 m^-3. Doping by indium increases nh to 4.5 * 10^22 m^-3. Calculate ne in the doped silicon. September 12, 2020 Category: Uncategorised (JEE Advanced Physics by BM Sharma + GMP Solutions) , Facebook Messenger WhatsApp Share this:TwitterFacebook Related